• Product Description
  • It boasts advantages such as light weight, softness, high purity, and a low thermal conductivity. It is suitable for high-temperature environments under vacuum or inert gas protection, delivering excellent thermal insulation performance at elevated temperatures. It is primarily used in crystal growth furnaces operating in ultra‑high‑purity conditions, including semiconductor crystal growth furnaces, photovoltaic monocrystalline silicon pulling furnaces, and optical fiber crystal growth furnaces.

    Technical Index Reference value
    Density (g/cm3)   0.08-0.12
    Carbon content (%)   ≥ 99.99
    Thermal conductivity (W/m·K)   0.22-0.25
    Ash content (ppm)   ≤ 50/20/5
    Tensile strength (MPa)   ≥ 0.12
    Bending strength (MPa)   --
    Thickness  (mm)   8-12
    Treatment temperature (℃) ≥2300

     

     

Keywords:

Product Inquiry

*Note: Please ensure that you provide accurate information and keep your contact details up to date. We will get in touch with you as soon as possible.